Why does the electronic industry use ultrapure water equipment?

Ultra pure water plays an increasingly important role in the production of electronic components mainly based on circuit boards. The quality of ultra pure water has become one of the important factors affecting the quality, production output and production cost of circuit boards and electronic components. In the production of electronic components, ultrapure water is mainly used for cleaning water and for preparing various solutions and slurries. Different electronic components have different requirements for pure water and water quality in production. In the production of transistors and integrated circuits, ultrapure water is mainly used to clean silicon wafers, and a small amount is used to prepare liquid medicine, water vapor source for silicon oxidation, cooling water for some equipment, and electroplating solution. 80% of the processes in the production of integrated circuits require high-purity water to clean silicon wafers. The quality of water is closely related to the quality and production of integrated circuit products. Alkali metals (K, Na, etc.) in the water will make the insulation film withstand voltage, heavy metals (Au, Ag, Cu, etc.) will reduce the PN junction voltage, Group III elements (B, Al, Ga, etc.) will make the characteristics of N-type semiconductor worse, and Group V elements (P, As, Sb, etc.) will make the characteristics of P-type semiconductor worse. It will deteriorate the characteristics of P-type semiconductor. Phosphorus (about 20-50% of ash) after high-temperature carbonization of bacteria in water will change the local area of P-type silicon wafer into N-type silicon, leading to deterioration of device performance. If particles (including bacteria) in water adsorb on the surface of silicon wafer, it will cause circuit short circuit or poor characteristics. Electronic ultrapure water is used to ensure the quality and safety of electronic products and promote the healthy operation of the electronic industry. Electronic ultrapure water equipment is used for the production and processing of silicon wafers, semiconductor materials and wafer materials with high purity water in the production of integrated circuits.